Silica glass containing TiO2 and process for its production
AssigneeAsahi Glass Company, Limited
InventorsYasutomi Iwahashi, Akio Koike
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Abstract
A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.
Claims14
A silica glass comprising TiO2, which has a fictive temperature of at most 1,000° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.
A silica glass comprising TiO2, which has a fictive temperature of at most 1,000° C., a F concentration of at least 500 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.
Dependencies are inferred from the claim text.