Method of making low-E coating using ceramic zinc inclusive target, and target used in same
AssigneeGuardian Industries Corp.
InventorsYiwei Lu, Thomas A. Seder
Life of this patent
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Abstract
A ceramic target is used in sputter-depositing a contact layer adjacent an infrared (IR) reflecting layer in certain example embodiments. For example, a ZnOx ceramic target may be used in sputter-depositing a zinc oxide inclusive layer over and/or under a silver based IR reflecting layer in certain embodiments. In certain example embodiments, the ceramic target may be doped with a non-metal such as F and/or B.
Claims15
A method of making a coated article including a coating supported by a glass substrate, the method comprising:
- depositing an infrared (IR) reflecting layer on the substrate;
- sputtering a ceramic target comprising zinc oxide in forming a first layer comprising zinc oxide on the substrate, where the layer comprising zinc oxide is a dielectric layer and directly contacts the IR reflecting layer and is located above or below the IR reflecting layer;
- wherein the zinc oxide of the ceramic target is substoichiometric;
- and
- wherein during said sputtering of the ceramic target oxygen and inert gas are provided in a sputtering chamber in which the ceramic target is being sputtered and where oxygen makes up no more than 20% of the total gas in the sputtering chamber in which the ceramic target is being sputtered, and wherein the ceramic target comprising zinc oxide is doped with from about 0.5 to 5.0% fluorine.
A method of making a coated article including a coating supported by a glass substrate, the method comprising:
- depositing an infrared (IR) reflecting layer on the substrate;
- sputtering a target comprising zinc oxide in forming a first layer comprising zinc oxide on the substrate, where the layer comprising zinc oxide is a dielectric layer and directly contacts the IR reflecting layer and is located above or below the IR reflecting layer;
- wherein the zinc oxide of the target is doped with from about 0.5 to 5.0% fluorine;
- and
- wherein during said sputtering of the target, oxygen and inert gas are provided in a sputtering chamber in which the target is being sputtered and where oxygen makes up no more than 20% of the total gas in the sputtering chamber in which the target is being sputtered.
Dependencies are inferred from the claim text.