Thermal processing apparatus, thermal processing method, and substrate processing apparatus
AssigneeSokudo Co., Ltd.
InventorsYasuhiro Fukumoto, Mitsuhiro Masuda, Toru Azuma
Life of this patent
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Abstract
In a thermal processing unit, a substrate is held by a local transport hand to be transported between a transfer section and a heating unit, and subjected to a heat processing by the heating unit. Also, the local transport hand is cooled by a cooling plate in the transfer section.
Claims16
A thermal processing apparatus for performing a thermal processing to a substrate, the thermal processing apparatus being used in a substrate processing apparatus including said thermal processing apparatus and a substrate transport device that carries/takes out the substrate into/from said thermal processing apparatus, said thermal processing apparatus comprising:
- a transfer section for receiving/transferring a substrate from/to said substrate transport device;
- a heating unit that performs a heat processing to the substrate;
- a substrate transport mechanism having a holding unit movable while holding the substrate, and transporting the substrate held by said holding unit between said heating unit and said transfer section;
- a cooling unit provided in said transfer section for cooling said holding unit of said substrate transport mechanism;
- and
- a control device that controls said substrate transport mechanism so that said holding unit is cooled by coming into contact with said cooling unit during the heat processing of the substrate by said heating unit.
A substrate processing apparatus comprising:
- a thermal processing apparatus that performs a thermal processing to a substrate;
- and
- a substrate transport device that carries/takes out the substrate into/from said thermal processing apparatus while transporting said substrate, said thermal processing apparatus comprising:
- a transfer section for receiving/transferring the substrate from/to said substrate transport device;
- a heating unit that performs a heat processing to the substrate;
- a substrate transport mechanism having a holding unit movable while holding the substrate, and transporting the substrate held by said holding unit between said heating unit and said transfer section;
- a cooling unit provided in said transfer section for cooling said holding unit of said substrate transport mechanism, wherein said holding unit is cooled by coming into contact with said cooling unit;
- and
- a control device that controls said substrate transport mechanism so that said holding unit is cooled by coming into contact with said cooling unit during the heat processing of the substrate by said heating unit.
A substrate processing apparatus for performing a processing to a substrate, comprising:
- a shelf having partition plates provided in a plurality of stages;
- and
- a plurality of thermal processing apparatuses arranged in the plurality of stages in said shelf;
- and
- a substrate transport device that carries/takes out the substrate into/from said plurality of thermal processing apparatuses,
- each of said plurality of thermal processing apparatuses comprising:
- a transfer section for receiving/transferring the substrate from/to said substrate transport device;
- a heating unit that performs a heat processing to the substrate;
- a substrate transport mechanism having a holding unit movable while holding the substrate, and transporting the substrate held by said holding unit between said heating unit and said transfer section;
- a cooling unit provided in said transfer section for cooling said holding unit of said substrate transport mechanism, wherein said holding unit is cooled by coming into contact with said cooling unit;
- and
- a control device that controls said substrate transport mechanism so that said holding unit is cooled by coming into contact with said cooling unit during the heat processing of the substrate by said heating unit.
A thermal processing method in a thermal processing apparatus of a substrate processing apparatus including said thermal processing apparatus and a substrate transport device that carries/takes out the substrate into/from said thermal processing apparatus, comprising the steps of:
- receiving the substrate in a transfer section for receiving/transferring the substrate from said substrate transport device,
- transporting the substrate received by said transfer section to a heating unit while holding the substrate by a holding unit of a substrate transport mechanism;
- performing a heat processing to the substrate in the heating unit;
- and
- cooling said holding unit of said substrate transport mechanism by causing said holding unit to come into contact with a cooling unit provided in said transfer section during the heat processing of the substrate by said heating unit.
Dependencies are inferred from the claim text.