# US 7,519,153 B1 · X-ray metrology with diffractors

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- Number: US 7,519,153 B1
- Document ID: US7519153B1
- Status: Granted
- Kind: B1
- Application number: 11/388,298
- Filed: 2006-03-24
- Granted: 2009-04-14
- Earliest claimed: 2006-03-24
- Assignees: KLA-Tencor Technologies Corporation
- Inventors: Jeffrey A. Moore
- Web page: https://patentgrep.com/patent/US7519153B1

## CPC

- G01N 23/20: by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- H01J 37/244: Detectors; Associated components or circuits therefor
- H01J 37/252: Tubes for spot-analysing by electron or ion beams; Microanalysers
- H10P 74/203: {Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects}
- H10P 74/23: {characterised by multiple measurements, corrections, marking or sorting processes}
- H01J 2237/24425: Wavelength-dispersive spectrometer
- H01J 2237/24592: Inspection and quality control of devices
- H01J 2237/2561: electron
- G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q)
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

An electron probe microanalysis (EPMA) system includes a graded multilayer diffractor for tightly focusing output x-rays onto an x-ray detector. The graded multilayer construction of the diffractor allows a high x-ray flux to be generated in a small measurement spot, which results in a high measurement throughput. The enhanced measurement efficiency provided by the graded multilayer diffractor can allow an EPMA system to be used as an in-line monitoring tool. The graded multilayer diffractor can include multiple reflecting surfaces. Multiple graded multilayer diffractors can also be used.

## Claims

### Claim 1

A method for processing a set of wafers comprising:
performing a first process on the set of wafers to create a processed set of wafers;
performing an inline analysis on at least one wafer of the processed set of wafers by focusing output x-rays from the wafer onto an x-ray detector using a graded multilayer diffractor; and
performing a second process on the processed set of wafers after performing the inline analysis.

### Claim 2 (depends on 1)

The method of claim 1, further including directing a probe beam at the wafer to generate the output x-rays.

### Claim 3 (depends on 2)

The method of claim 2, wherein the probe beam is one of an e-beam and an x-ray beam.

### Claim 4 (depends on 1)

The method of claim 1, wherein performing the inline analysis includes focusing different sets of output x-rays with different wavelengths using a set of graded multilayer diffractors.

### Claim 5 (depends on 4)

The method of claim 4, wherein each graded multilayer diffractor is configured to measure a predetermined element x-ray.

### Claim 6

An x-ray analysis metrology system for analyzing a test sample, the x-ray analysis metrology system comprising:
a probe beam source for directing a probe beam onto the test sample;
a graded multilayer diffractor for focusing output x-rays from the test sample; and
an x-ray detector for capturing the focused output x-rays,
wherein the graded multilayer diffractor facilitates inline analysis of production wafers.

### Claim 7 (depends on 6)

The x-ray analysis metrology system of claim 6, wherein the probe beam source is one of an e-beam source and an x-ray beam source.

### Claim 8 (depends on 6)

The x-ray analysis metrology system of claim 6, wherein the graded multilayer diffractor includes a set of graded multilayer diffractors and the x-ray detector includes a set of x-ray detectors, thereby allowing simultaneous measurement of different elements within the test sample.

### Claim 9 (depends on 6)

The x-ray analysis metrology system of claim 6, wherein the graded multilayer diffractor is symmetrical in shape.

### Claim 10 (depends on 6)

The x-ray analysis metrology system of claim 6, wherein the graded multilayer diffractor is asymmetrical in shape.

### Claim 11 (depends on 6)

The x-ray analysis metrology system of claim 6, wherein the graded multilayer diffractor is cylindrical in shape.

### Claim 12 (depends on 6)

The x-ray analysis metrology system of claim 6, wherein the graded multilayer diffractor is spherical in shape.

### Claim 13 (depends on 6)

The x-ray analysis metrology system of claim 6, wherein the graded multilayer diffractor is paraboloidal in shape.

### Claim 14 (depends on 6)

The x-ray analysis metrology system of claim 6, wherein the graded multilayer diffractor is toroidal in shape.

### Claim 15 (depends on 6)

The x-ray analysis metrology system of claim 6, wherein the graded multilayer diffractor is ellipsoidal in shape.