Integrateable capacitors and microcoils and methods of making thereof
AssigneePalo Alto Research Center Incorporated
InventorsKoenraad Van Schuylenbergh, Eugene M. Chow, JengPing Lu
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AssigneePalo Alto Research Center Incorporated
InventorsKoenraad Van Schuylenbergh, Eugene M. Chow, JengPing Lu
Estimating the term…
Methods for integrally forming high Q tunable capacitors and high Q inductors on a substrate are described. A method for integrally forming a capacitor and a microcoil on a substrate may involve depositing and patterning a dielectric layer on the substrate, depositing and patterning a sacrificial layer on the substrate, depositing and patterning conductive material on the semiconductor substrate, depositing and patterning a polymer layer on the semiconductor substrate, removing an exposed portion of the conductive material exposed by the patterned polymer layer to release a portion of the conductive pattern from the semiconductor substrate to form out-of-plane windings of the microcoil, depositing second conductive material on exposed portions of the conductive material, and removing the sacrificial layer. The patterned conductive material may include a windings portion of the microcoil, an overlapping electrode portion of the capacitor and a support portion for the electrode of the capacitor.
A method for integrally forming a capacitor and a microcoil on a semiconductor substrate, the method comprising:
A method for integrally forming a capacitor and a microcoil on a substrate, the method comprising:
A method for integrally forming a capacitance region and a microcoil on a substrate, the method comprising:
Dependencies are inferred from the claim text.