Method for manufacturing porous structure and method for forming pattern
AssigneeKabushiki Kaisha Toshiba
InventorsKoji Asakawa, Toshiro Hiraoka, Yoshihiro Akasaka, Yasuyuki Hotta
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Abstract
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
Claims3
A method for forming a pattern comprising:
- on a substrate, forming a film comprised of a pattern forming material;
- wherein the pattern forming material comprises a block copolymer or graft copolymer comprising;
- a polymer chain selected from the group consisting of a polyacrylonitrile chain, a polyacrylonitrile derivative chain, a polycyclohexadiene derivative chain, a polybutadiene chain, a polysilane chain, polysiloxane chain, a polyamic acid chain and a polyaniline derivative chain;
- and
- a thermally decomposable polymer chain;
- forming a microphase-separated structure in the film, the microphase-separated structure comprising a thermally decomposable polymer phase and a remaining polymer phase;
- removing the thermally decomposable polymer phase from the microphase-separated structure by heating said film to a thermal decomposition temperature or more, to form a pattern of the microphase-separated structure;
- and
- transferring the pattern of the microphase-separated structure to the substrate by etching the substrate using the remaining polymer phase in the film as a mask.
Dependencies are inferred from the claim text.