Methods for producing metallic implants having roughened surfaces
AssigneeDePuy Products, Inc.
InventorsHai Bo Wen, Panjian Li, Todd Smith
Life of this patent
Estimating the term…
Abstract
The invention provides a method of providing a metallic orthopaedic implant with a micron or nanometer-scale surface roughness to facilitate acceptance of tissue and bone growth or apposition after implantation while maintaining the structural integrity of the orthopaedic implant. The invention also provides a metallic orthopaedic implant comprising a metallic body and metallic elements adhered to a portion of the surface of the metallic body to define a three-dimensional porous surface geometry, wherein at least some of the metallic elements have a micron or nanometer-scale surface roughness.
Claims30
A method of providing a metallic orthopaedic implant with a micron or nanometer-scale surface roughness to facilitate acceptance of tissue and bone growth or apposition after implantation, which method comprises the steps of:
- (a) providing a metallic orthopaedic implant comprising a metallic body having a surface and metallic elements adhered to at least a portion of the surface of the metallic body to define a three-dimensional porous surface geometry and
- (b) exposing at least a portion of the surface and metallic elements to an etching solution comprising (i) at least one fluoride salt, (ii) at least one acid selected from the group consisting of hydrochloric acid, sulfuric acid, and nitric acid and mixtures thereof, (iii) a sulfate salt, and (iv) water for a time and under conditions sufficient to etch the surface and provide the implant with micron or nanometer-scale surface roughness, wherein the acid is present in the etching solution at a concentration of 0.1 N or more.
A method of providing a metallic orthopaedic implant having a native oxide surface layer with a micron or nanometer-scale surface roughness to facilitate acceptance of tissue and bone growth or apposition after implantation, which method comprises the steps of:
- (a) providing a metallic implant having a native oxide surface layer and at least a portion thereof to be altered to provide a micron or nanometer-scale surface roughness,
- (b) exposing the portion of the surface layer to an etching solution comprising (i) at least one fluoride salt, (ii) at least one acid selected from the group consisting of hydrochloric acid, sulfuric acid, and nitric acid and mixtures thereof, (iii) a sulfate salt, and (iv) water for a time and under conditions sufficient to etch at least a portion of the native oxide surface layer and provide the implant with the micron or nanometer-scale surface roughness, wherein the acid is present in the etching solution at a concentration of 0.1 N or more.
A method of providing a metallic orthopaedic implant with a micron or nanometer-scale surface roughness to facilitate acceptance of tissue and bone growth or apposition after implantation, which method comprises the steps of:
- (a) providing a metallic orthopaedic implant comprising a metallic body having a surface and metallic elements adhered to at least a portion of the surface of the metallic body to define a three-dimensional porous surface geometry and
- (b) exposing at least a portion of the surface and metallic elements to an etching solution comprising (i) at least one fluoride salt, (ii) at least one acid, (iii) a sulfate salt, and (iv) water for a time and under conditions sufficient to etch the surface and provide the implant with micron or nanometer-scale surface roughness, wherein the acid is present in the etching solution at a concentration of 0.1 N or more.
A method of providing a metallic orthopaedic implant having a native oxide surface layer with a micron or nanometer-scale surface roughness to facilitate acceptance of tissue and bone growth or apposition after implantation, which method comprises the steps of:
- (a) providing a metallic implant having a native oxide surface layer and at least a portion thereof to be altered to provide a micron or nanometer-scale surface roughness and
- (b) exposing the portion of the surface layer to an etching solution comprising (i) at least one fluoride salt, (ii) at least one acid, (iii) a sulfate salt, and (iv) water for a time and under conditions sufficient to etch at least a portion of the native oxide surface layer and provide the implant with the micron or nanometer-scale surface roughness, wherein the acid is present in the etching solution at a concentration of 0.1N or more.
Dependencies are inferred from the claim text.