Apparatus for determining a temperature of a substrate and methods therefor
AssigneeLam Research Corporation
InventorsKeith Gaff, Neil Martin Paul Benjamin
Life of this patent
Estimating the term…
Abstract
An apparatus for measuring a temperature of a substrate is disclosed. The apparatus includes a phosphor material in direct contact with the substrate and in thermal contact with the substrate, the phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, the fluorescent response decaying at a decay rate that is related to a temperature of the phosphor material, and the phosphor material producing a first set of non volatile byproducts when expose to a plasma.
Claims25
In a plasma processing system, an apparatus for measuring a temperature of a substrate, the apparatus comprising:
- a phosphor material in direct contact with said substrate and in thermal contact with said substrate, said phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, said fluorescent response decaying at a decay rate that is related to a temperature of said phosphor material;
- a barrier window positioned between said phosphor material and a plasma, wherein said barrier window allows at least a portion of said first wavelength and said second wavelength to be transmitted;
- and
- a gasket configured to surround said phosphor material,
- wherein said phosphor material, said barrier window, and said gasket are disposed inside a notch, said notch disposed on a surface of said substrate.
In a plasma processing system, an apparatus of measuring a temperature of a substrate, the apparatus comprising:
- a phosphor material configured for producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, said fluorescent response decaying at a decay rate that is related to a temperature of said phosphor material;
- a barrier window positioned between said phosphor material and a plasma, wherein said barrier window allows at least a portion of said first wavelength and said second wavelength to be transmitted;
- means of determining said temperature from said decay rate of said fluorescent response when said electromagnetic radiation is transmitted to said phosphor material through said barrier window;
- and
- a gasket configured to surround said phosphor material,
- wherein said phosphor material, said barrier window, and said gasket are disposed inside a notch, said notch disposed on a surface of said substrate.
In a plasma processing system, a method for measuring a temperature of a substrate, comprising:
- thermally coupling a phosphor material to said substrate, said phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, said fluorescent response decaying at a decay rate that is related to a temperature of said phosphor material;
- providing a gasket, said gasket configured to surround said phosphor material;
- positioning a barrier window between said phosphor material and a plasma, wherein said barrier window allows at least a portion of said first wavelength and said second wavelength to be transmitted;
- disposing said phosphor material, said gasket, and barrier in a notch, said notch disposed on a surface of said substrate;
- and
- determining said temperature from said decay rate of said fluorescent response when said electromagnetic radiation is transmitted to said phosphor material through said barrier window.
Dependencies are inferred from the claim text.