Apparatus for abatement of by-products generated from deposition processes and cleaning of deposition chambers

An assembly for abating F2 from by-products generated during cleaning of a processing chamber, said assembly comprising:

• a tube which is highly resistant to oxidation and corrosive gases up to a temperature of at least about 400° C. and having first and second open ends, said first open end being adapted for direct inline connection to a foreline exiting the chamber and said second open end being adapted for direct inline connection to an exhaust line downstream of said tube;
• a gas panel adapted to control a flow rate of H2 exiting said gas panel;
• and
• a gas line connecting said gas panel with said tube, for directly injecting H2 into said tube at a flow rate controlled by said gas panel.

An assembly for abating F2 from by-products generated during cleaning of a processing chamber, said assembly comprising:

• a tube which is highly resistant to oxidation and corrosive gases up to a temperature of at least about 400° C. and having first and second open ends, said first open end being adapted for direct inline connection to a foreline exiting the chamber and said second open end being adapted for direct inline connection to an exhaust line downstream of said tube;
• a cooling jacket surrounding and thermally connected to said tube;
• a gas panel adapted to control a flow rate of H2 exiting said gas panel;
• a gas line connecting said gas panel with said tube, for directly injecting H2 into said tube at a flow rate controlled by said gas panel;
• and
• a pressure gauge in line with said gas line for monitoring a pressure within said gas line;
• wherein said gas panel further comprises a gas control means for shutting off a flow of H2 through said gas line, wherein said gas panel controls said gas control means to shut off the flow of H2 upon receiving a signal from said pressure gauge that indicates that a predetermined pressure level has been exceeded.

An assembly for abating F2 from by-products generated during cleaning of a processing chamber, said assembly comprising:

• a tube which is highly resistant to oxidation and corrosive gases up to a temperature of at least about 400° C. and having first and second open ends, said first open end being adapted for direct inline connection to a foreline exiting the chamber and said second open end being adapted for direct inline connection to an exhaust line downstream of said tube;
• a gas panel adapted to control a flow rate of H2 exiting said gas panel;
• a gas line connecting said gas panel with said tube, for directly injecting H2 into said tube at a flow rate controlled by said gas panel;
• and
• a scrubber connectable downstream of said tube and adapted to scrub HF by-product resulting from reacting the F2 with the H2.