Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program

A method of obtaining information regarding a substrate, said method comprising:

• measuring positions of first and second features on a substrate and storing the measured positions in at least one memory;
• comparing a relative position between the first and second features on the substrate, said relative position being based on the measured positions, with at least one of a plurality of relative positions of corresponding first and second features, stored in said memory, each of the plurality of stored relative positions of the corresponding first and second features being associated with information characterizing at least one substrate to distinguish said at least one substrate from other substrates that have different relative positions of the first and second features;
• and
• indicating a correspondence between the relative position of the first and second features and one of the plurality of stored relative positions of the corresponding first and second features.

A device manufacturing method comprising:

• manufacturing a plurality of devices on a set of substrates, each substrate having a marker and a feature at a unique position relative to the marker;
• for at least one of the set of substrates, measuring a position of at least one of the feature and the marker relative to the other of the feature and the marker, and storing the measured position in at least one memory;
• comparing the measured relative position to at least one of a plurality of entries in a data set stored in the memory, each entry corresponding to a relative position between the marker and feature of one of the set of substrates;
• and
• identifying the substrate by selecting an entry corresponding to the measured relative position to distinguish the substrate from other substrates that have different relative positions of the marker and the feature,
• wherein said manufacturing includes modifying a process operation based on the identity of the substrate.

A method of labeling a substrate, said method comprising:

• providing the substrate with a first feature;
• providing the substrate with a second feature;
• and
• recording and storing in at least one memory a correspondence between a relative position of the first and second features and information characterizing the substrate to distinguish the substrate from other substrates that have different relative positions of corresponding first and second features.

A device manufacturing method comprising:

• manufacturing a plurality of devices on a set of substrates, each substrate having a marker that indicates a position of the substrate and a feature at a position relative to the marker, and storing the positions in at least one memory;
• and
• for one of the set of substrates, determining a relative position of the marker and feature to distinguish said one of the set of substrates from other substrates that have different relative positions of the marker and the feature,
• wherein said manufacturing includes selecting an aspect of a process operation on the substrate based on the determined relative position.

A lithographic substrate comprising:

• a first feature;
• and
• a second feature at a relative position to the first feature,
• wherein the relative position indicates information that has been encoded onto the lithographic substrate, and stored in at least one memory, to distinguish the lithographic substrate from other substrates that have different relative positions of corresponding first and second features.