Transflective liquid crystal display and method of fabricating the same

A method for fabricating a transflective liquid crystal display, comprising steps of:

• providing a substrate, comprising a plurality of pixels with a transmissive region and a reflective region;
• forming a silicon layer on the pixels;
• forming a first insulating layer on the substrate covering the silicon layer;
• forming a first conductive layer on the first insulating layer, and defining the first conductive layer into at least two scan lines and a gate electrode;
• forming a thin film transistor comprising a doped silicon layer by the side of the gate electrode, wherein the doped silicon at one side of the gate electrode serves as a drain region, the doped silicon at the other side of the gate electrode serves as a source region, and the doped silicon covering a large portion of the pixels serves as a transparent electrode, and wherein the transparent electrode is conductively connected to the thin film transistor;
• forming a second insulating layer on the first insulating layer covering the gate electrode;
• forming a first contact plug, perforating through the second insulating layer and the first insulating layer to the source and drain region;
• forming a second conductive layer on the second insulating layer, and defining the second conductive layer into at least two data lines, a drain electrode, and a source electrode, wherein the data lines and the scan lines intersect and form a pixel region;
• forming a passivation insulating layer on the second insulating layer covering the data lines, the drain electrode, and the source electrode;
• removing a portion of the passivation insulating layer, the second insulating layer, and the first insulating layer exposing the transparent electrode;
• and
• forming a reflective electrode on the passivation insulating layer, wherein the reflective electrode is located within the reflective region, and conductively connected to the same thin film transistor.