Metal resistor and resistor material
AssigneeInternational Business Machines Corporation
InventorsChih-Chao Yang, Kaushik Chanda, Shyng-Tsong Chen
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Abstract
A metal resistor and resistor material are disclosed. The metal resistor may include an infused metal selected from the group consisting of: copper (Cu) infused with at least one of silicon (Si), nitrogen (N2), carbon (C), tantalum (Ta), titanium (Ti) and tungsten (W), and aluminum infused with at least one of silicon (Si), nitrogen (N2), carbon (C), tantalum (Ta), titanium (Ti) and tungsten (W). The resistor material may include one of: copper (Cu) infused with at least one of silicon (Si), nitrogen (2), carbon (C), tantalum (Ta), titanium (Ti) and tungsten (W), and aluminum infused with at least one of silicon (Si), nitrogen (N2), carbon (C), tantalum (Ta), titanium (Ti) and tungsten (W).
Claims3
A metal resistor, comprising:
- an infused metal selected from the group consisting of:
- copper (Cu) infused with at least one of carbon (C), tantalum (Ta), titanium (Ti) and tungsten (W), and aluminum infused with at least one of silicon (Si), nitrogen (N2), carbon (C), tantalum (Ta), titanium (Ti) and tungsten (W);
- and
- wherein the infused metal includes an infusion species material selected from the group consisting of:
- silane (SiH4), methane (CH4), tantalum (Ta), titanium (Ti), ammonia (NH3) and tungsten (W).
A resistor material, comprising:
- copper (Cu) infused with at least one of carbon (C), tantalum (Ta), titanium (Ti) and tungsten (W), and aluminum infused with at least one of silicon (Si), nitrogen (N2), carbon (C), tantalum (Ta), titanium (Ti) and tungsten (W);
- and
- wherein the infused copper (Cu) includes an infusion species material selected from the group consisting of:
- silane (SiH4), methane (CH4), tantalum (Ta), titanium (Ti), ammonia (NH3) and tungsten (W).
Dependencies are inferred from the claim text.