Methodology for critical dimension metrology using stepper focus monitor information
AssigneeInternational Business Machines Corporation
InventorCharles N. Archie
Life of this patent
Estimating the term…
Abstract
A method of producing an accurate critical dimension measurement comprises navigating to a critical dimension structure, performing a scanning electron microscope focusing, performing a final location alignment, acquiring waveform data, analyzing the data to determine an approximate critical dimension, analyzing the data to determine a stepper focus parameter, combining the stepper focus parameter with the critical dimension to generate an accurate critical dimension value, and reporting the same.
Claims26
A method of producing an optimum critical dimension value, said method comprising:
- acquiring a waveform of data for a critical dimension structure;
- determining a stepper focus parameter for said critical dimension structure;
- calculating an approximate critical dimension measurement for said critical dimension structure;
- calibrating said data of said waveform by determining at least three best fit data parameters for improving a linearity of said waveform;
- combining said stepper focus parameter with said approximate critical dimension measurement and said best fit data parameters, wherein said combining removes structural bias parameters from said approximate critical dimension measurement;
- and
- generating said optimum critical dimension value from said combining, wherein said optimum critical dimension value comprises structural measurements of said critical dimension structure that are only relevant to a critical dimension of said critical dimension structure.
A method of producing an optimum critical dimension value, said method comprising:
- generating a scanning electron microscope focus;
- generating a waveform data based on output from said scanning electron microscope focus;
- analyzing said waveform data to determine an approximate critical dimension measurement;
- calibrating said waveform data by determining at least three best fit data parameters for improving a linearity of said waveform data;
- analyzing said waveform data to determine a stepper focus parameter;
- combining said stepper focus parameter with said approximate critical dimension measurement and said best fit data parameters, wherein said combining removes structural bias from said approximate critical dimension measurement;
- and
- generating said optimum critical dimension value from said combining, wherein said optimum critical dimension value comprises structural measurements of a critical dimension structure that are only relevant to a critical dimension of said critical dimension structure.
A method of producing an optimum critical dimension value, said method comprising:
- generating a scanning electron microscope focus;
- generating an image data based on output from said scanning electron microscope focus;
- analyzing said image data to determine an approximate critical dimension measurement;
- calibrating said image data by determining at least three best fit data parameters for improving a linearity of said image data;
- analyzing said image data to determine a stepper focus parameter;
- combining said stepper focus parameter with said approximate critical dimension measurement and said best fit data parameters, wherein said combining removes structural bias from said approximate critical dimension measurement;
- and
- generating said optimum critical dimension value from said combining, wherein said optimum critical dimension value comprises structural measurements of a critical dimension structure that are only relevant to a critical dimension of said critical dimension structure.
A method of producing an optimum critical dimension value, said method comprising:
- acquiring data representative of a critical dimension structure;
- determining a stepper focus parameter for said critical dimension structure;
- measuring an approximate critical dimension measurement for said critical dimension structure;
- calibrating said data by determining at least three best fit data parameters for improving a linearity of said data;
- combining said stepper focus parameter with said approximate critical dimension measurement and said best fit data parameters, wherein said combining removes structural bias parameters from said approximate critical dimension measurement;
- and
- generating said optimum critical dimension value based on said combining, wherein said optimum critical dimension value comprises structural measurements of said critical dimension structure that are only relevant to a critical dimension of said critical dimension structure.
A method of producing an optimum critical dimension value, said method comprising:
- acquiring data representative of a critical dimension structure;
- determining a stepper focus parameter for said critical dimension structure;
- measuring an approximate critical dimension measurement for said critical dimension structure;
- calibrating said data by determining at least three best fit data parameters for improving a linearity of said data;
- combining said stepper focus parameter with said approximate critical dimension measurement and said best fit data parameters, wherein said combining removes structural bias parameters from said approximate critical dimension measurement;
- and
- generating said optimum critical dimension value based on said combining, wherein said optimum critical dimension value comprises structural measurements of said critical dimension structure that are only relevant to a critical dimension of said critical dimension structure;
- wherein said determining further comprises:
- navigating to a stepper focus monitor target;
- performing a scanning electron microscope focusing at said target;
- performing a final alignment of said target based on said scanning electron microscope focusing at said target;
- acquiring a first data set from said scanning electron microscope focusing;
- analyzing said first data set;
- and
- determining said stepper focus parameter based on said analyzing;
- wherein said generating further comprises:
- navigating to said critical dimension structure;
- performing a scanning electron microscope focusing at said critical dimension structure;
- performing a final alignment of said critical dimension structure;
- acquiring a second data set from said scanning electron microscope focusing at said critical dimension structure;
- analyzing said second data set;
- and
- determining said optimum critical dimension value based on said analyzing.
A program storage device readable by a computer, tangibly embodying a program of instructions executable by the computer to perform a method of producing an optimum critical dimension value, said method comprising:
- acquiring a waveform of data for a critical dimension structure;
- determining a stepper focus parameter for said critical dimension structure;
- calculating an approximate critical dimension measurement for said critical dimension structure;
- calibrating said data of said waveform by determining at least three best fit data parameters for improving a linearity of said waveform;
- combining said stepper focus parameter with said approximate critical dimension measurement and said best fit data parameters, wherein said combining removes structural bias parameters from said approximate critical dimension measurement;
- and
- generating said optimum critical dimension value from said combining, wherein said optimum critical dimension value comprises structural measurements of said critical dimension structure that are only relevant to a critical dimension of said critical dimension structure.
Dependencies are inferred from the claim text.