US 7,479,632 B1 · E-beam vision system for monitoring and control

Abstract

A method of characterizing an electron beam is described, comprising providing a system including an electron gun having a steering coil. A material having a surface is also provided. An electron beam from said electron gun is directed to said surface. The directing includes providing a first current to the steering coil to direct the electron beam to a first point on the surface and then providing a second current to the steering coil to direct the electron beam to a second point on the surface. An imaging system is mounted for viewing said surface. An image is collected based on light emitted from the surface because of the electron beam directed at the first point and the second point. A light intensity is determined at the first point and at the second point.

Claims31

Dependent claims

A method of characterizing an electron beam, comprising:

a. providing a system including an electron gun having a steering coil;
b. providing a material having a surface;
c. directing an electron beam from said electron gun to said surface, wherein said directing includes providing a first current to said steering coil to direct said electron beam to a first point on said surface and then providing a second current to said steering coil to direct said electron beam to a second point on said surface;
d. providing an imaging system mounted for viewing said surface;
and
e. collecting an image based on light emitted from said surface because of said electron beam directed at said first point and said second point and determining a light intensity at said first point and at said second point.

3 more elements

Dependencies are inferred from the claim text.

E-beam vision system for monitoring and control

Life of this patent

E-beam vision system for monitoring and control

Life of this patent

Abstract

Claims31