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US 7,479,449 B2Granted
Underfill and mold compounds including siloxane-based aromatic diamines
AssigneeIntel Corporation
InventorSaikumar Jayaraman
Life of this patent
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Abstract
A method including introducing a composition including a siloxane-based aromatic diamine in a flowable state between a first substrate including a first set of contact points and a second substrate including a second set of contact points coupled to the first substrate through interconnections between a portion of the first set of contact points a portion of the second set of contact points; and curing the composition.
Claims12
A method comprising:
- introducing a composition comprising a siloxane-based aromatic diamine in a flowable state between a first substrate comprising a first set of contact points and a second substrate comprising a second set of contact points coupled to the first substrate through interconnections between a portion of the first set of contact points and a portion of the second set of contact points;
- and
- curing the composition,
- wherein the siloxane-based aromatic diamine has a formula:
- wherein groups R1 and R2 are independently selected from a group consisting of hydrogen, an alkyl, a substituted alkyl, an aryl, a substituted aryl moiety, and an —OR7 moiety, wherein R7 is selected from a group consisting of an aliphatic and an aromatic moiety,
- wherein groups R3, R4, R5, and R6 are independently selected from a group consisting of hydrogen, an alkyl, a substituted alkyl, a cycloaliphatic, an alkyl ether, an aryl, and a substituted aryl moiety, except that groups R3, R4, R5 and R6 cannot each be a hydrogen, and
- wherein groups R8 and R9 are independently selected from a group consisting of hydrogen, an aliphatic, and an aromatic moiety.
4 more elements
Dependencies are inferred from the claim text.