Process for integrating planar and non-planar CMOS transistors on a bulk substrate and article made thereby

A method of forming a microprocessor including both a planar logic transistor and non-planar SRAM transistors of differing channel width, the method comprising:

• forming a logic active region of a bulk semiconductor substrate, the logic active region having sidewalls adjacent to a logic trench isolation region of the bulk semiconductor substrate;
• forming a first SRAM active region of the bulk semiconductor substrate, the first SRAM active region having sidewalls adjacent to a first SRAM trench isolation region of the bulk semiconductor substrate;
• forming a second SRAM active region of the bulk semiconductor substrate, the second SRAM active region having sidewalls adjacent to a second SRAM trench isolation region of the bulk semiconductor substrate;
• recessing a top surface of the first SRAM trench isolation region by a first amount to expose at least a portion of the first SRAM active region sidewall;
• recessing a top surface of the second SRAM trench isolation region by a second amount to expose at least a portion of the second SRAM active region sidewall, the second amount of recess being different than the first amount of recess;
• forming a first gate insulator adjacent to at least a portion of the first SRAM active region sidewall and forming a second gate insulator adjacent to at least a portion of the second SRAM active region sidewall;
• and
• forming a third gate insulator only on the top surface of the logic active region;
• forming a first, second and third gate electrode adjacent to the first, second and third gate insulators, respectively;
• and
• forming a pair of source/drain regions on opposite sides of the first, second and third gate electrodes, respectively, to form the planar logic transistor and a first and second non-planar SRAM transistor of differing channel widths.