Method of manufacturing semiconductor laser element by formation and removal of ridge part protrusion
AssigneeSharp Kabushiki Kaisha
InventorShinichi Kawato
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AssigneeSharp Kabushiki Kaisha
InventorShinichi Kawato
Estimating the term…
A method of manufacturing a semiconductor laser element having an enhanced yield ratio is provided. The semiconductor laser element having a cladding layer, an intermediate layer, and a capping layer is manufactured as follows. At the laminating step, a plurality of lamination layers are laminated in a laminating direction. Subsequently, at protruding step, a cladding layer, a capping layer and a precursor of an intermediate layer are formed so that widthwise lengths of the cladding layer and the capping layer become shorter or uniform in the laminating direction, and so that the precursor of an intermediate layer protrudes widthwise from the cladding layer and the capping layer. At removing step, an protrusion of the precursor of the intermediate layer is removed.
A method of manufacturing a semiconductor laser element having a ridge part comprising a cladding layer, a capping layer and an intermediate layer therebetween, the method comprising:
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