Back to results
US 7,479,361 B2Granted
Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process
AssigneeNEC Electronics Corporation
InventorsSeiji Nagahara, Masayuki Hiroi
Life of this patent
Estimating the term…
Abstract
An objective of this invention is to prevent resist poisoning and sensitivity deterioration in a chemically amplified resist. The chemically amplified resist comprises a base resin, a photoacid generator and a salt exhibiting buffer effect in the base resin.
Claims7
A chemically amplified resist composition comprising:
- a base resin;
- a photoacid generator which generates an acid by exposure;
- and
- a salt exhibiting buffer effect in the base resin, wherein said salt exhibiting buffer effect generates an acid-base pair in a resist composition without neutralizing the acid generated by the photoacid generator and behaves as if it is a buffer.
1 more element
Dependencies are inferred from the claim text.