Method for modifying a metallic surface
AssigneeDanfoss A/S
InventorSoeren Eriksen
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Abstract
The invention relates to a method for modifying a metallic surface, which method comprises chemical vapour deposition on a substrate in a chamber adapted for CVD and involves at least the step of interrupting the chemical vapour deposition by cutting off the flow of reactant gas, and where the substrate and the metallic surface form a part of a completed member and that this member during or after the interruption is subjected to a polishing of the metallic surface after depositing at least a part of the depositing metallic compound.
Claims24
A method for modifying a metallic surface, the method comprising chemical vapour deposition on a substrate in a chamber adapted for CVD involving the steps of:
- i) subjecting the substrate to chemical vapour deposition with a flow of reactant gas comprising a metal compound to be incorporated in the metallic surface;
- ii) interrupting the chemical vapour deposition by cutting off the flow of reactant gas;
- and
- iii) repeating steps (i) and (ii) at least once, so that the substrate and the metallic surface form a part of a completed member and said member during the interruption is subjected to a polishing of the metallic surface after depositing a part of the metal compound.
A method for modifying a metallic surface, the method comprising chemical vapour deposition on a substrate in a chamber adapted for CVD comprising the steps of:
- i) subjecting the substrate to chemical vapour deposition with a flow of reactant gas comprising a metal compound to be incorporated in the metal surface;
- ii) interrupting the chemical vapour deposition by cutting off the flow of reactant gas;
- and
- iii) repeating steps (i) and (ii) at least once, so that the substrate and the metallic surface form a part of a completed member and said member during the interruption is subjected to a polishing of the metallic surface after depositing a part of the metal compound, the polishing being by a reactive gas comprising halogen.
Dependencies are inferred from the claim text.