Fabrication method for arranging ultra-fine particles
AssigneeThe Regents of the University of California
InventorsSeung-Heon Lee, Frédéric S. Diana, Antonio Badolato, Pierre M. Petroff, Edward J. Kramer
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Abstract
A method and resultant device, in which metal nanoparticles are self-assembled into two-dimensional lattices. A periodic hole pattern (wells) is fabricated on a photoresist substrate, the wells having an aspect ratio of less than 0.37. The nanoparticles are synthesized within inverse micelles of a polymer, preferably a block copolymer, and are self-assembled onto the photoresist nanopatterns. The nanoparticles are selectively positioned in the holes due to the capillary forces related to the pattern geometry, with a controllable number of particles per lattice point.
Claims14
A fabricated device comprising:
- a photoresist coated-substrate formed with wells through its surface, said wells having gradually sloping walls and an aspect ratio of less than 0.37, and micelles enclosing nanoparticles disposed in said wells.
A fabricated device comprising:
- a GaAs substrate coated with a photoresist layer of a photo sensitive chemical resistant to acid, said substrate and photoresist layer defining wells that have gradually sloping walls and an aspect ratio of less than 0.37, and micelles within said wells, said micelles incorporating cobalt nanoparticles in the device.
Dependencies are inferred from the claim text.