Resonator structure and method of producing it

A resonator structure in particular a bulk-acoustic-wave resonator, such as a film BAW resonator or a solidly-mounted BAW resonator comprising at least one substrate, at least one reflector layer applied or deposited on the substrate, at least one bottom electrode layer, in particular bottom electrode, applied or deposited on the reflector layer, at least one piezoelectric layer, in particular C-axis normal piezoelectric layer, applied or deposited on the bottom electrode layer, at least one top electrode layer, in particular top electrode, applied or deposited on the bottom electrode layer and/or on the piezoelectric layer such that the piezoelectric layer is between the bottom electrode layer and the top electrode layer, characterized by at least one dielectric layer applied or deposited in and/or on at least one space in at least one region of non-overlap between the bottom electrode layer and the top electrode layer, wherein the bottom electrode is deposited on a select portion of the reflector layer, said at least one dielectric layer associated with the bottom electrode is deposited on a remaining portion the reflector layer, and the top electrode is deposited on a select portion of the piezoelectric layer above the deposited dielectric layer and a portion of the bottom layer, such that the area of the deposited dielectric area represents the at least one non-overlapping region.