# US 7,464,457 B2 · Method for forming a write head having an air bearing surface (ABS)

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- Number: US 7,464,457 B2
- Document ID: US7464457B2
- Status: Granted
- Kind: B2
- Application number: 11/469,132
- Filed: 2006-08-31
- Published: 2006-12-28
- Granted: 2008-12-16
- Earliest claimed: 2003-09-26
- Assignees: Hitachi Global Storage Technologies Netherlands B.V.
- Inventors: Quang Le; Edward Hin Pong Lee; Jui-Lung Li; Aron Peniek; Nian-Xiang Sun
- Web page: https://patentgrep.com/patent/US7464457B2

## CPC

- G11B 5/1278: {specially adapted for magnetisations perpendicular to the surface of the record carrier}
- G11B 5/112: {Manufacture of shielding device}
- Y10T 29/49021: Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T 29/49032: Fabricating head structure or component thereof
- Y10T 29/49041: with significant slider/housing shaping or treating
- Y10T 29/49043: Depositing magnetic layer or coating
- Y10T 29/49044: Plural magnetic deposition layers
- Y10T 29/49046: with etching or machining of magnetic material
- Y10T 29/49048: Machining magnetic material [e.g., grinding, etching, polishing]
- Y10T 29/49052: by etching
- Y10T 29/49067: Specified diverse magnetic materials
- G11B: INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER (recording measured values in a way that does not require playback through a transducer G01D9/00; recording or playback apparatus using mechanically marked tape, e.g. punched paper tape, or using unit records, e.g. punched or magnetically marked cards G06K; transferring data from one type of record carrier to another G06K1/18; circuits for coupling output of reproducer to radio receiver H04B1/20; gramophone pick-ups or like acoustic electromechanical transducers or circuits therefor H04R)
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

Methods for forming write heads. One method includes forming a mask layer above a pole tip layer; forming a layer of resist above the mask layer; patterning the resist; removing portions of the mask layer not covered by the patterned resist; shaping a pole tip from the pole tip layer; depositing a layer of dielectric material above the pole tip and flux shaping layer, wherein the layer of dielectric material extends about adjacent to the mask layer; depositing a stop layer over the dielectric material, the stop layer abutting the mask layer; and polishing for forming a substantially planar upper surface comprising the mask layer and stop layer. Another method includes depositing a layer of dielectric material at least adjacent the pole tip, wherein the layer of dielectric material extends about adjacent to the mask layer. A further method includes forming dishing in the pole tip.

## Claims

### Claim 1

A method for forming a write head having an air bearing surface (ABS), comprising:
forming a mask layer above a pole tip layer;
forming a layer of resist above the mask layer;
patterning the resist, the patterned resist defining about a maximum width of a pole tip in a direction parallel to the ABS of the head;
removing portions of the mask layer not covered by the patterned resist;
shaping a pole tip from the pole tip layer;
depositing a layer of dielectric material above the pole tip, wherein the layer of dielectric material extends about adjacent to the mask layer;
depositing a stop layer over the dielectric material, the stop layer abutting the mask layer; and
polishing to remove the resist layer, the dielectric layer formed above the resist layer and a portion of the stop layer for forming a substantially co-planar upper surface of the mask layer and the stop layer.

### Claim 2 (depends on 1)

The method as recited in claim 1, wherein the pole tip layer is laminated.

### Claim 3 (depends on 1)

The method as recited in claim 1, wherein the mask layer is formed of a material selected from a group consisting of carbon, a silicon nitrate, a tantalum oxide, a silicon oxide, and durimide.

### Claim 4 (depends on 1)

The method as recited in claim 1, wherein the mask layer is formed of a material selected from a group consisting of Si3N4, Ta2O5, SiO2, and durimide.

### Claim 5 (depends on 1)

The method as recited in claim 1, wherein the mask layer is formed of carbon formed by filtered cathodic arc (FCA) deposition.

### Claim 6 (depends on 1)

The method as recited in claim 1, wherein the mask layer is a multilayer structure.

### Claim 7 (depends on 6)

The method as recited in claim 6, wherein the mask layer comprises at least one layer of carbon and at least one layer of durimide.

### Claim 8 (depends on 1)

The method as recited in claim 1, wherein the pole tip layer is shaped to taper together towards the shaping layer along a plane perpendicular to the ABS.

### Claim 9 (depends on 1)

The method as recited in claim 1, further comprising removing the mask layer prior to forming the gap layer, and forming dishing in the pole tip.

### Claim 10 (depends on 9)

The method as recited in claim 9, wherein the dishing is formed by etching.

### Claim 11 (depends on 1)

The method as recited in claim 1, wherein the head is a perpendicular head.