Uniform pressing apparatus for use in a micro-nano imprint process

A uniform pressing apparatus adapted to perform a nanoimprint operation on a substrate, the substrate having opposite top and bottom surfaces, said uniform pressing apparatus comprising:

• a lower pressing unit including
• a supporting container having an upwardly opening accommodating space, and an annular top surface defining a top end of said accommodating space and adapted to abut against the bottom surface of the substrate such that a top end of said accommodating space is sealed by the substrate,
• a pressure equalizing liquid received within said accommodating space in said supporting container, and
• pressurizing equipment including a piston member extending into said accommodating space in said supporting container and operable to push said pressure equalizing liquid upwardly in an axial direction;
• an upper pressing unit disposed directly above said lower pressing unit and movable relative to said supporting container of said lower pressing unit;
• and
• a mold adapted to be disposed on the top surface of the substrate and having a forming surface adapted to allow the top surface of the substrate to be pressed thereagainst by said lower pressing unit.