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US 7,462,028 B2Granted
Partial vacuum environment imprinting
AssigneeMolecular Imprints, Inc.
InventorsAnshuman Cherala, Pankaj B. Lad, Ian M. McMackin, Byung-Jin Choi
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Abstract
The present invention is directed towards a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold.
Claims5
A system for creating a specific environment during a nanolithography imprinting process, comprising:
- a substrate disposed on a chuck surface;
- a template stage having an air bearing reference surface;
- an air bearing surface disposed around the substrate and interfacing with the air bearing reference surface creating an interface gap;
- a template coupled to the template stage and positioned in close proximity to the substrate creating a controlled volume surrounding a nano-imprint mold on the template and the substrate;
- and
- a means for creating a partial vacuum in the controlled volume surrounding the nano-imprint mold and the substrate thereby enabling a gas flow through the interface gap and the controlled volume to create the specific environment in the controlled volume.
3 more elements
Dependencies are inferred from the claim text.