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US 7,460,309 B2Granted
Variable lens and exposure system
AssigneeASML Netherlands B.V.
InventorWillem J. Venema
Life of this patent
Estimating the term…
Abstract
A lithography apparatus comprising variable lenses is described. These variable lenses are included in a microlens array. At least some of the lenses have two or more immiscible liquids whose optical properties can be varied, for example, by an application of a voltage.
Claims10
A microlens array, comprising:
- a matrix of lenses arranged in rows and columns;
- and
- a first liquid and a second liquid associated with the matrix of lenses, wherein a focal position of respective lenses in the microlens array is controlled by applying a voltage to the lenses using address/data lines coupled to respective ones of the lenses of the microlens array using a data/address scheme, and
- wherein the first liquid and the second liquid are substantially immiscible and have different refractive indices.
1 more element
A lithography apparatus, comprising:
- an illumination system;
- a patterning device;
- a projection system including a microlens array, the microlens array comprising,
- a matrix of lenses arranged in rows and columns;
- and
- a first liquid and a second liquid associated with the matrix of lenses, wherein a focal position of respective lenses in the microlens array is controlled by applying a voltage to the lenses using address/data lines coupled to respective ones of the lenses of the microlens array using a data/address scheme, and
- wherein the first liquid and the second liquid are substantially immiscible and have different refractive indices.
4 more elements
A device manufacturing method, comprising:
- controlling a focal position of a matrix of lenses arranged in rows and columns having a first liquid and a second liquid in a microlens array by applying a voltage to respective ones of the matrix of lenses using address/data lines coupled to respective ones of the lenses of the microlens array using a data/address scheme, and
- wherein the first liquid and the second liquid are substantially immiscible and have different refractive indices;
- and
- exposing a substrate to radiation using the microlens array.
1 more element
Dependencies are inferred from the claim text.