Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected

An apparatus for inspecting a specimen, comprising:

• a light source having a lamp to emit a light;
• an illumination optical unit having an objective lens to illuminate a specimen on which plural patterns are formed with the light emitted from the light source and passed through a first group of lenses;
• an image forming optical unit having a second group of lenses to form an image of light which is reflected from the specimen and passed through the second group of lenses;
• an image detecting unit which detects the image formed by the image forming optical unit with a TDI image sensor;
• a processor which processes a signal outputted from the image detecting unit by the detection of the image and detects a defect of the specimen,
• wherein an accumulation time of the TDI sensor is controlled based on an intensity of the light detected by the TDI sensor, and a light wavelength selection unit is installed on a light pass between the light source and the TDI sensor to form the image with light having a wavelength selected from the wavelengths of the light emitted from the light source.