Alignment apparatus, exposure apparatus, and device manufacturing method using exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorHiroyuki Maruyama
Life of this patent
Estimating the term…
Abstract
An alignment apparatus includes driving means having a movable element and a stator, a measurement unit which measures a position of a moving member moved by the driving means using measurement light, and a discharging unit to discharge gas existing in an optical path of the measurement light. The discharging unit is provided to the stator.
Claims18
An alignment apparatus comprising:
- a driving unit having a movable element and a stator;
- a measurement unit which measures a position of a moving member moved by said driving unit using light;
- and
- a gas supply unit which supplies gas of which a temperature is adjusted to an optical path of said measurement unit;
- and
- a discharging unit to discharge said gas in the optical path of the measurement light,
- wherein said discharging unit has a plurality of discharging flow passages in said stator, and a sectional area of one discharging flow passage is different from a sectional area of another discharging flow passage from among the plurality of the discharging flow passages.
An exposure apparatus which exposes a pattern of a master to a substrate, comprising an alignment apparatus including:
- a driving unit having a movable element and a stator, a measurement unit which measures a position of a moving member which moves and holds the mater or substrate using light, and a gas supply unit which supplies gas of which a temperature is adjusted to an optical path of said measurement unit, and
- and a discharging unit to discharge gas existing in the optical path of the light, said discharging unit having a plurality of discharging flow passages in said stator, and a sectional area of one discharging flow passage being different from a sectional area of another discharging flow passage from among the plurality of the discharging flow passages.
An alignment apparatus comprising:
- a driving unit having a movable element and a stator, the movable element having a magnet and the stator having a coil, said driving unit moves the movable element by applying current with the coil;
- a measurement unit which measures a position of a moving member which moves in a horizontal plane by said driving unit using light;
- a gas supply unit which supplies gas of which a temperature is adjusted to an optical path of said measurement unit;
- and
- a discharging unit to discharge said gas existing in the optical path of the light,
- wherein the stator has two planes which are parallel to the horizontal plane of the moving member and opposite to each other and said discharging unit is provided to said stator and discharges the gas through a space sandwiched between the two planes.
An exposure apparatus which exposes a pattern of a master to a substrate, comprising an alignment apparatus which aligns the master or the substrate, said alignment apparatus including:
- a driving unit having a movable element and a stator, the movable element having a magnet and the stator having a coil, said driving unit moves the movable element by applying current with the coil;
- a measurement unit which measures a position of a moving member which holds the master or the substrate and moves in a horizontal plane by said driving unit using light;
- a gas supply unit which supplies gas of which a temperature is adjusted to an optical path of said measurement unit;
- and
- a discharging unit to discharge said gas existing in the optical path of the light,
- wherein the stator has two planes which are parallel to the horizontal plane of the moving member and opposite to each other and said discharging unit is provided to said stator and discharges the gas through a space sandwiched between the two planes.
An alignment apparatus comprising:
- a driving unit having a movable element and a stator, the movable element having a magnet and the stator having a coil, said driving unit moves the movable element by applying current with the coil;
- a measurement unit which measures a position of a moving member which moves in a horizontal plane by said driving unit using light;
- a gas supply unit which supplies gas of which a temperature is adjusted to an optical path of said measurement unit;
- and
- a discharging unit to discharge said gas existing in the optical path of the light,
- wherein said discharging unit is provided to said stator so as to discharge the gas in a direction parallel to the horizontal plane of the moving member.
An exposure apparatus which exposes a pattern of a master onto a substrate, comprising an alignment apparatus which aligns the master or the substrate, said alignment apparatus including:
- a driving unit having a movable element and a stator, the movable element having a magnet and the stator having a coil, said driving unit moves the movable element by applying current with the coil;
- a measurement unit which measures a position of a moving member which holds the master or the substrate and moves in a horizontal plane by said driving unit using light;
- a gas supply unit which supplies gas of which a temperature is adjusted to an optical path of said measurement unit;
- and
- a discharging unit to discharge said gas existing in the optical path of the light,
- wherein said discharging unit is provided to said stator so as to discharge the gas in a direction parallel to the horizontal plane of the moving member.
Dependencies are inferred from the claim text.