Electron confinement inside magnet of ion implanter
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsAnthony Renau, Joseph C. Olson, Shengwu Chang, James Buff
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AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsAnthony Renau, Joseph C. Olson, Shengwu Chang, James Buff
Estimating the term…
A method and apparatus are disclosed for improving space charge neutralization adjacent a magnet of an ion implanter by confining the electrons inside a magnetic region thereof to reduce electron losses and therefore improve the transport efficiency of a low energy beam. A magnetic pole member for a magnet of an ion implanter is provided that includes an outer surface having a plurality of magnetic field concentration members that form magnetic field concentrations adjacent the magnetic pole member. Electrons that encounter this increased magnetic field are repelled back along the same magnetic field line rather than allowed to escape. An analyzer magnet and ion implanter including the magnet pole are also provided so that a method of improving low energy ion beam space charge neutralization in an ion implanter is realized.
A magnet pole for a magnet for use in an ion implanter, the magnet pole comprising:
A method of improving low energy ion beam space charge neutralization in an ion implanter, the method comprising the steps of:
An analyzer magnet for an ion implanter, the analyzer magnet comprising:
An ion implanter comprising:
Dependencies are inferred from the claim text.