Lithographic apparatus, device manufacturing method, and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorsJan Evert Van Der Werf, Mark Kroon, Wilhelmus Cornelis Keur, Vadim Yevgenyevich Banine, Hans Van Der Laan, Johannes Hubertus Josephina Moors, Erik Roelof Loopstra
Life of this patent
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Abstract
A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.
Claims29
A radiation sensor to detect radiation in a lithographic apparatus, comprising:
- a radiation-sensitive material configured to convert ultraviolet radiation having a wavelength smaller than 50 nm into secondary radiation, wherein the secondary radiation comprises visible light or ultraviolet light having a wavelength larger than or equal to 50 nm;
- and
- a detector constructed and arranged to detect the secondary radiation emerging from the radiation-sensitive material and constructed and arranged to determine intensity of the ultraviolet radiation having a wavelength smaller than 50 nm using intensity of the secondary radiation.
A radiation sensor to detect radiation in a lithographic apparatus, comprising:
- a collector configured to collect secondary radiation from a radiation-sensitive material that emits secondary radiation when exposed to ultraviolet radiation having a wavelength smaller than 50 nm, wherein the collector or radiation-sensitive material comprises a plurality of elements configured to receive incident radiation;
- and
- a measuring device constructed and arranged to measure the secondary radiation emerging from the radiation-sensitive material to determine an intensity, and/or distribution thereof, of the ultraviolet radiation.
An image sensor configured to detect a patterned ultraviolet radiation in a lithographic apparatus, comprising:
- a patterned layer of material configured to receive the patterned ultraviolet radiation, the ultraviolet radiation having a wavelength smaller than 50 nm;
- a radiation-sensitive material configured to receive at least a portion of the ultraviolet radiation from the patterned layer and to emit secondary radiation in response thereto;
- and
- a detector constructed and arranged to detect the secondary radiation emerging from the radiation-sensitive material and to determine an optical or spatial characteristic of the patterned ultraviolet radiation based upon the detected secondary radiation.
A radiation sensor to detect radiation in a lithographic apparatus, comprising:
- a plurality of individual elements of radiation-sensitive material configured to receive ultraviolet radiation having a wavelength smaller than 50 nm and to release an electric charge;
- and
- a measuring device constructed and arranged to measure the electric charge released from the individual elements, an electric charge induced to compensate the electric charge released from the individual elements, or a change in the resistance of the individual elements, and constructed and arranged to determine intensity, and/or a distribution thereof, of the ultraviolet radiation using the measurement.
Dependencies are inferred from the claim text.