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US 7,459,669 B2Granted
Sensor and lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsRob Adrianus Antonius Maria Bastiaensen, Marcel Maurice Hemerik, Marcus Adrianus Van De Kerkhof, Jeroen Johannes Sophia Maria Mertens, Jacob Sonneveld
Life of this patent
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Abstract
A sensor for use in a lithographic apparatus, the sensor having a liquid to prevent optical losses, especially when receiving radiation with a high NA. The liquid is fixed between two surfaces by capillary forces in an area through which radiation passes.
Claims33
A sensor for a lithographic apparatus, comprising:
- a transmissive member disposable to receive radiation from a projection system of the lithographic apparatus and having a first surface;
- a luminescent member with a second surface;
- a liquid between the first surface and the second surface, wherein the first surface and the second surface are arranged to exert capillary forces on the liquid;
- and
- a plurality of intermediate bodies arranged between the first surface and the second surface to surround the liquid, the bodies having at least one space therebetween such that the bodies exert capillary forces on the liquid between neighboring intermediate bodies.
2 more elements
A sensor for a lithographic apparatus, comprising:
- a first surface;
- a second surface, wherein the sensor includes a transmissive member disposable to receive radiation from a projection system of the lithographic apparatus and a luminescent member having a liquid fixed between the transmissive member and the second surface of the luminescent member due to capillary forces;
- and
- a plurality of intermediate bodies arranged between the first surface and the second surface to surround the liquid, the bodies having at least one space therebetween such that the bodies exert capillary forces on the liquid between neighboring intermediate bodies.
1 more element
Dependencies are inferred from the claim text.