Method of manufacturing an AMOLED

A method of manufacturing an active matrix organic light-emitting diode (AMOLED), the method comprising:

• providing a substrate;
• forming at least a data line and at least a drain metal on the substrate;
• forming a buffer insulator layer on the substrate, the data line and the drain metal;
• forming at least an active layer on the buffer insulator layer;
• forming a gate insulator layer on the active layer and the buffer insulator layer;
• forming a gate metal on the gate insulator layer above the active layer;
• using the gate metal as a self-alignment mask and doping an ion on the active layer to form a source and a drain on the corresponding sides of the gate metal;
• forming a plurality of via holes on the gate insulator layer that reach the data line, the drain metal, the drain and the source surface;
• forming a plurality of transparent electrodes on each via hole and the gate insulator layer surface, each transparent electrode electrically contacting with the data line, the drain, and the drain metal;
• forming a pixel define layer on the transparent electrode, the gate metal, and the gate insulator layer to expose the transparent electrode;
• and
• forming a light-emitting diode on the transparent electrode.