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US 7,459,327 B2Granted
Method for manufacturing micro lenses including underlayer film and lens film etching steps
AssigneeSanyo Electric Co., Ltd.
InventorsSeiji Kai, Ryouji Matsui, Tetsuya Yamada, Tsutomu Imai, Kazuyuki Takegawa
Life of this patent
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Abstract
A solid-state imager is disclosed wherein isolation regions (4) are covered with power supply lines (8), a light-transmitting lens film (24) whose surface forms continuous convex portions above the isolation regions (4) convex towards channel regions (5) is provided, and a light-transmitting material having a refractive index lower than that of the lens film (24) is provided over the lens film (24).
Claims3
A method of manufacturing micro lenses, the method comprising:
- an underlayer film etching step for etching a flat light transmitting underlayer film along a predetermined mask pattern to form convex regions between adjacent micro lens forming regions;
- a lens film laminating step for laminating a light transmitting lens film of a shape reflecting a shape of the underlayer film on the underlayer film;
- and
- an etching step for forming concave regions in the lens film over the convex regions by applying a resist over the lens film to flatten the surface of the lens film and applying an etching process under a condition that the lens film is more easily etched than the resist, wherein
- the lens film has a refractive index higher than that of a substance provided in a layer above the lens film.
2 more elements
Dependencies are inferred from the claim text.