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US 7,459,262 B2Granted
Photoimageable, thermosettable fluorinated resists
AssigneeE. I. DuPont de Nemours and Company
InventorYoung H. Kim
Life of this patent
Estimating the term…
Abstract
The present invention provides fluorinated, thermosettable compositions that are photoimageable and which function as low dielectric materials. Such low dielectric materials are useful as passivation resist layers in liquid crystal displays, electroluminescent displays, light emitting diodes and semiconductor manufacture.
Claims16
A polymer composition comprising:
- (a) a repeat unit derived from a fluoro-olefin selected from a group consisting of tetrafluoroethylene, hexafluoropropylene, chlorotrifluoroethylene, vinylidene fluoride, perfluoro-(2,2-dimethyl-1,3-dioxole), perfluoro-(2-methylene-4-methyl-1,3-dioxolane), and CF2═CFO(CF2)tCF═CF2, where t is 1 or 2, and Rf″OCF═CF2 wherein Rf″ is a fluoroalkyl group of from 1 to 10 carbon atoms;
- (b) a repeat unit comprising at least one cross-linkable functional group, R, having the following structure
- wherein R1 is H or C1 -C3 alkyl, and Rf and Rf' taken together are (CF2)nwherein n is 2 to 10;
- and
- (c) a repeat unit comprising at least one protected acid functional group.
2 more elements
A photoimageable composition comprising:
- (a) a repeat unit derived from a fluoro-olefin selected from tetrafluoroethylene, hexafluoropropylene, chlorotrifluoroethylene, vinylidene fluoride, perfluoro-(2,2-dimethyl-1,3-dioxole), perfluoro-(2-methylene-4-methyl-1,3-dioxolane), CF2═CFO(CF2)tCF═CF2, where t is 1 or 2, and Rf″OCF═CF2 wherein Rf″ is a fluoroalkyl group of from 1 to 10 carbon atoms;
- (b) a repeat unit comprising at least one functional group, R, having the followimg structure
- wherein R1 is H or C1-C3 alkyl, and Rf and Rf' taken together are (CF2)nwherein n is 2 to 10;
- (c) a repeat unit comprising at least one protected acid functional group;
- and
- (d) a photoacid generator.
3 more elements
A thermosettable composition comprising:
- (a) a repeat unit derived from a fluoro-olefin selected from tetrafluoroethylene, hexafluoropropylene, chlorotrifluoroethylene, vinylidene fluoride, perfluoro-(2,2-dimethyl-1,3-dioxole), perfluoro-(2-methylene-4-methyl-1,3-dioxolane), CF2═CFO(CF2)tCF═CF2, where t is 1 or 2, and Rf″OCF═CF2 wherein Rf″ is a fluoroalkyl group of from 1 to 10 carbon atoms;
- (b) a repeat unit comprising at least one functional group, R, having the following structure
- wherein R1 is H or C1-C3 alkyl, and Rf and Rf' taken together are (CF2)nwherein n is 2 to 10;
- (c) a repeat unit comprising at least one protected acid functional group;
- and
- (d) an acid catalyst.
3 more elements
A photoimageable and thermosettable composition comprising:
- (a) a repeat unit derived from a fluoro-olefin selected from tetrafluoroethylene, hexafluoropropylene, chlorotrifluoroethylene, vinylidene fluoride, perfluoro-(2,2-dimethyl-1,3-dioxole), perfluoro-(2-methylene-4-methyl-1,3-dioxolane), CF2═CFO(CF2)tCF═CF2, where t is 1 or 2, and Rf″OCF═CF2 wherein Rf″ is a fluoroalkyl group of from 1 to 10 carbon atoms;
- (b) a repeat unit comprising at least one functional group, R, having the following structure
- wherein R1 is H or C1-C3 alkyl, and Rf Rf' taken together are (CF2)nwherein n is 2 to 10;
- (c) a repeat unit comprising at least one protected acid functional group;
- and
- (d) a photoacid generator.
3 more elements
Dependencies are inferred from the claim text.