Substrate retainer
AssigneeApplied Materials, Inc.
InventorsSteven M. Zuniga, Hung Chih Chen
Life of this patent
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Abstract
A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
Claims3
A carrier head for holding a substrate in engagement with a polishing surface, comprising:
- a substrate backing member to engage an upper surface of the substrate and apply a downward force to the substrate;
- and
- a retainer including a plurality of arcuate sections positioned to annularly surround the substrate backing member, each arcuate section having an inward facing retaining surface, each arcuate section being independently radially movable relative to other sections;
- wherein each arcuate section extends from a fixed upper end to a lower end that is laterally movable relative to the fixed upper end;
- wherein the retainer includes a unitary annular body, and an upper end of each arcuate section is joined to the unitary annular body;
- and
- wherein the unitary annular body includes a bottom surface to contact the polishing pad.
Dependencies are inferred from the claim text.