Cleaning method, cleaning apparatus and electro optical device
AssigneeSeiko Epson Corporation
InventorsToshiko Hosoda, Shinichi Yotsuya
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Abstract
A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.
Claims5
A cleaning method of removing an organic substance attached to a vapor deposition mask of an electro-optical device, comprising, in order:
- exposing the vapor deposition mask to a derivative of pyrrolidone to remove the organic substance;
- exposing the vapor deposition mask to water;
- and
- exposing the vapor deposition mask to ethanol.
Dependencies are inferred from the claim text.