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AssigneeApplied Materials, Inc.
InventorsMark Crockett, John W. Lane, Micahel DeChellis, Chris Melcer, Erica Porras, Aneesh Khullar, Balarabe N. Mohammed
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A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention pertains to a diffusion bonded integrated fluid flow network architecture, which includes, in addition to a layered substrate containing fluid flow channels, an in-line filter and may include various fluid handling and monitoring components. The integrated fluid delivery system that is formed from a layered substrate is diffusion bonded, and the various fluid handling and monitoring components may be partially integrated or fully integrated into the substrate, depending on design and material requirements.
An in-line filter present within a layered substrate which forms at least a portion of a fluid flow channel, said layered substrate comprising a plurality of adhered metal layers, including a series of layers having shaped through holes formed therein, wherein a portion of said shaped through holes are positioned in an alignment which forms a cavity, wherein said cavity is filled with a sintered media which acts as a filtering agent, wherein another portion of said shaped through holes provides an entry to and an exit from said in-line filter, and wherein at least a portion of said adhered metal layers are diffusion bonded layers.
Dependencies are inferred from the claim text.