Method of manufacturing electron-emitting device, electron source, and image display device
AssigneeCanon Kabushiki Kaisha
InventorsYoshimi Uda, Yoshihiro Yanagisawa, Kazuya Ishiwata
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Abstract
In a method of manufacturing an electron-emitting device, an electroconductive film formed on a substrate is subjected to a clean processing to remove a foreign matter from the electroconductive film, and thereafter, energization is conducted on the electroconductive film, to form an electron-emitting region. Accordingly, there is provided an electron-emitting device which avoids a formation defect of the electron-emitting region due to the existence of the foreign matter and which has satisfactory characteristics without fluctuation.
Claims12
A method of manufacturing an electron-emitting device, comprising steps of:
- forming an electroconductive film on a substrate;
- removing a foreign matter from the electroconductive film formed;
- and
- after removing the foreign matter, conducting energization on the electroconductive film, to form an electron-emitting region on the electroconductive film,
- wherein the foreign matter is removed from the electroconductive film by ejecting a cleaning liquid to the electroconductive film, and the cleaning liquid is ejected under a liquid pressure equal to or higher than 5 MPa.
A method of manufacturing an electron-emitting device, comprising steps of:
- forming an electroconductive film on a substrate;
- ejecting a cleaning liquid to the electroconductive film formed, to clean the electroconductive film;
- and
- after cleaning the electroconductive film, conducting energization on the electroconductive film cleaned, to form an electron-emitting region on the electroconductive film,
- wherein the cleaning liquid is ejected under a liquid pressure equal to or higher than 5 MPa.
Dependencies are inferred from the claim text.