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US 7,458,871 B2Granted
Gas discharge panel production method
AssigneeFujitsu Hitachi Plasma Display Limited
InventorsTadayoshi Kosaka, Souichirou Hidaka
Life of this patent
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Abstract
According to the present invention, there is provided a gas discharge panel having at least a protective film containing a driving voltage-reducing compound.
Claims3
A method of producing a gas discharge panel comprising:
- forming a protective film containing a driving voltage-reducing compound by exposing a protective film to an atmosphere of driving voltage-reducing compound directly after forming the protective film,
- wherein the protective film is a MgO film, and the MgO film is exposed to a vapor atmosphere of compound selected from 1-propanol, diethylene glycol monobutyl ether acetate, methane, α-terpineol and 1-butanol after forming the MgO film.
A method of producing a gas discharge panel comprising:
- exposing a protective film to an atmosphere of driving voltage-reducing compound after irradiating the protective film with vacuum UV rays, thereby forming a protective film containing a driving voltage-reducing compound,
- wherein the protective film is a MgO film, and the MgO film is exposed to a vapor atmosphere of compound selected from 1-propanol, diethylene glycol monobutyl ether acetate, methane, α-terpineol and 1-butanol after forming the MgO film.
A method of producing a gas discharge panel comprising:
- heating a protective film to 300° C. or more, cooling the same to atmospheric temperature, and then exposing the protective film to an atmosphere of driving voltage-reducing compound, thereby forming a protective film containing a driving voltage-reducing compound,
- wherein the protective film is a MgO film, and the MgO film is exposed to a vapor atmosphere of compound selected from 1-propanol, diethylene glycol monobutyl ether acetate methane, α-terpineol and 1-butanol after forming the MgO film.
Dependencies are inferred from the claim text.