Environmental system including vacuum scavenge for an immersion lithography apparatus
AssigneeNikon Corporation
InventorsAndrew J Hazelton, Michael Sogard
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AssigneeNikon Corporation
InventorsAndrew J Hazelton, Michael Sogard
Estimating the term…
An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that fills the gap and collects the immersion fluid that is directly between the fluid barrier and the device. The fluid barrier can include a scavenge inlet that is positioned near the device, and the immersion fluid system can include a low pressure source that is in fluid communication with the scavenge inlet. The fluid barrier confines any vapor of the immersion fluid and prevents it from perturbing a measurement system. Additionally, the environmental system can include a bearing fluid source that directs a bearing fluid between the fluid barrier and the device to support the fluid barrier relative to the device.
A lithographic projection apparatus comprising:
A lithographic projection apparatus comprising:
A lithographic projection apparatus comprising:
A liquid containment system for a liquid immersion lithography apparatus in which a substrate is exposed through a projection system and a liquid is filled in a space between the projection system and the substrate, comprising:
Dependencies are inferred from the claim text.