Control of X-ray beam spot size
AssigneeJordan Valley Semiconductors Ltd.
InventorsIsaac Mazor, David Berman
Life of this patent
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Abstract
A method for analysis of a sample includes directing a beam of radiation to impinge on a target area on a surface of the sample along a beam axis at a plurality of different elevation angles. For each of the different angles, a respective offset of the beam in a direction transverse to the beam axis is determined. While sensing the radiation scattered from the sample at each of the different elevation angles in succession, a transverse correction is applied to at least one of the beam and the sample in order to compensate for the respective offset at each of the different elevation angles.
Claims17
A method for analysis of a sample, comprising:
- directing a beam of radiation to impinge on a target area on a surface of the sample along a beam axis at each of a plurality of different elevation angles in succession;
- determining, for each of the different angles, a respective offset of the beam in a direction transverse to the beam axis;
- while directing the beam of radiation to impinge on the target area at each of the different elevation angles, applying a transverse correction to at least one of the beam and the sample to compensate for the respective offset;
- and
- sensing the radiation scattered from the sample while the beam irradiates the target area at each of the different elevation angles subject to the transverse correction.
Apparatus for analysis of a sample, comprising:
- a radiation source, which is configured to direct a beam of radiation toward a target area on a surface of the sample over a range of elevation angles;
- a detector assembly, which is configured to sense the radiation that is scattered from the sample;
- a beam limiter, which is configured to control the beam so that the radiation impinges on the target area along a beam axis at each of a plurality of different elevation angles in succession within the range;
- a motion assembly, which is configured to shift at least one of the beam and the sample in a direction transverse to the beam axis;
- and
- a processor, which is coupled to record a respective offset of the beam in the direction transverse to the beam axis at each of the different elevation angles, and to control the motion assembly so as to apply a transverse correction to the at least one of the beam and the sample in order to compensate for the respective offset while the beam irradiates the target area at each of the different elevation angles.
A method for analysis of a sample, comprising:
- directing a beam of radiation to impinge on a target area on a surface of the sample along a beam axis at a plurality of different elevation angles;
- determining, for each of the different angles, a respective offset of the beam in a direction transverse to the beam axis;
- sensing the radiation scattered from the sample at each of the different elevation angles in succession;
- and
- while sensing the radiation at each of the different elevation angles, applying a transverse correction to at least one of the beam and the sample in order to compensate for the respective offset at each of the different elevation angles.
Dependencies are inferred from the claim text.