Exposure apparatus, exposure method, and method for producing device

An exposure apparatus which exposes a substrate with a patterned beam through a liquid onto the substrate, the exposure apparatus comprising:

• a projection optical system having an optical axis, through which the patterned beam is directed onto the substrate through the liquid;
• a liquid supply system including a supply inlet, which supplies the liquid onto the substrate such that a liquid immersion area is formed on only a part of a substrate surface;
• a liquid recovery system including a recovery outlet, which recovers the liquid on the substrate;
• and
• a liquid-attractive surface located radially farther from the optical axis of the projection optical system than the recovery outlet of the liquid recovery system,
• wherein the substrate is moved below the liquid-attractive surface in a direction substantially perpendicular to the optical axis of the projection optical system.

An exposure method comprising:

• supplying a liquid onto a substrate via a supply inlet and recovering the supplied liquid from the substrate via a recovery outlet such that only a part of a surface of the substrate is covered by the liquid;
• projecting a pattern image onto the substrate by a projection optical system through the liquid filled in a gap between the projection optical system and the substrate;
• and
• moving the substrate below the projection optical system and a liquid-attractive surface which is located radially farther from an optical axis of the projection optical system than the recovery outlet,
• wherein an affinity of a substrate surface for the liquid is lower than an affinity of the liquid-attractive surface.