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US 7,453,130 B2Granted
Semiconductor apparatus and method for fabricating the same
AssigneeSharp Kabushiki Kaisha
InventorJunichi Nakai
Life of this patent
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Abstract
A semiconductor apparatus comprises: a light input/output portion provided in an upper portion of a semiconductor substrate, the light input/output portion having an opening region for light associated to the light input/output portion to pass through; a transparent film covering the opening region; and an interlayer lens provided on the transparent film, the interlayer lens positioned such that an optical axis of the interlayer lens is parallel to a central axis of the opening region.
Claims14
A semiconductor apparatus comprising:
- a light input/output portion provided in an upper portion of a semiconductor substrate, the light input/output portion having an opening region for light associated to the light input/output portion to pass through, the opening region having a central axis and being bounded by a light shielding layer;
- a transparent film covering and contacting the opening region, said transparent layer having an upper surface opposite the opening region, wherein said upper surface has a concave region formed therein above the opening region;
- and
- an interlayer lens provided on the concave region formed in the upper surface of the transparent film, the interlayer lens positioned such that an optical axis of the interlayer lens is aligned with the central axis of the opening region, so that the optical axis of the interlayer lens and the central axis of the opening region are parallel and matched,
- wherein the light shielding layer is asymmetric with respect to the central axis of the opening region, as viewed from a cross-section of the semiconductor apparatus, said central axis being perpendicular to the surface of the semiconductor substrate.
2 more elements
A method for fabricating a semiconductor apparatus comprising:
- forming a light input/output portion having an opening region for passing through associated light in an upper portion of a semiconductor substrate, the opening region having a central axis;
- forming a light shield layer with an opening for exposing the opening region of the light input/output portion;
- forming a transparent film so as to cover and contact the opening region, said transparent layer having an upper surface opposite the opening region;
- forming a concave region in the upper surface of the transparent film;
- and
- forming an interlayer lens provided on the concave region formed in the upper surface of the transparent film, the interlayer lens being formed such that an optical axis of the interlayer lens is aligned with the central axis of the opening region, so that the optical axis of the interlayer lens and the control axis of the opening region are parallel and matched,
- wherein the light shielding layer is asymmetric with respect to the central axis of the opening region, as viewed from a cross-section of the semiconductor apparatus, said central axis being perpendicular to the surface of the semiconductor substrate.
4 more elements
Dependencies are inferred from the claim text.