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US 7,452,659 B2Granted
Methods of patterning a surface using single and multilayer molecular films
AssigneeThe Penn State Research Foundation
InventorGregory S. McCarty
Life of this patent
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Abstract
Surface features are fabricated using a single layer or multi-layer molecular resist. The resist is preferably a selective adsorption resist. Selective adsorption resist is a resist that allows a deposited material to penetrate the resist such that the resist will reform on the top of the deposited material. Also, a nanofabricated system enables monitoring of the addition or removal of molecular species or proteins from a junction by monitoring the electronic properties of the junction.
Claims6
A method of patterning a surface for use in a nanoscale device comprising:
- depositing a first material on the surface;
- applying a resist to the first material and to the surface;
- applying a molecular layer to the first material;
- applying a second material to the surface, such that the first material is separated from the second material by the molecular layer, wherein the second material and the molecular layer are selected such that the second material penetrates the molecular layer to deposit on the first material;
- and
- removing the molecular layer to result in a structure formed from the first material and the second material.
3 more elements
Dependencies are inferred from the claim text.