Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
AssigneeMolecular Imprints, Inc.
InventorsVan N. Truskett, Christopher J. Mackay, B. Jin Choi
Life of this patent
Estimating the term…
Loading patent…
AssigneeMolecular Imprints, Inc.
InventorsVan N. Truskett, Christopher J. Mackay, B. Jin Choi
Estimating the term…
The present invention provides a method to reduce adhesion between a polymerizable layer and a substrate surface that selectively comes into contact with the polymerizable layer. The method features disposing a coating upon the surface from a composition having a perfluoro silane containing molecule. The perfluoro silane molecule is connected to bonding regions on the surface forming covalent bonding groups, as well as contact regions. The contact regions include fluorinated chains of molecules. The covalent bonding groups are positioned between the surface and the contact regions. The perfluoro silane containing molecule may be applied to the surface as a monomolecular layer from a di-functional perfluoro silane molecule. Exemplary molecules that may be employed as the perfluoro silane containing molecule includes molecules sold under the trade-names FLUOROSYL™ FSD 2500 and FLUOROSYL™ FSD 4500.
A method to reduce adhesion between a polymerizable imprinting layer and an imprint device substrate surface in an imprint lithography process;
Dependencies are inferred from the claim text.