US 7,452,443 B2 · Vacuum plasma generator

Abstract

A vacuum plasma generator is used for treating workpieces in a vacuum chamber. The vacuum plasma generator includes a mains connection for connection to a voltage supply network, and at least one mains rectifier. The at least one mains rectifier is connected to at least one first converter that generates at least one intermediate circuit voltage, a first RF signal generator, a second RF signal generator, and at least one 3 dB coupler. The first RF signal generator is connected to at least one intermediate circuit voltage, for generating a first signal of a basic frequency and of a first phase position. The second RF signal generator is connected to at least one intermediate circuit voltage, for generating a second signal of the basic frequency and of a second phase position. The least one 3 dB coupler couples the first and the second signal into an output signal of the generator.

Claims23

Dependent claims

A vacuum plasma generator for treating workpieces in a vacuum chamber, the vacuum plasma generator comprising:

a mains connection for connection to a voltage supply network;
and
at least one mains rectifier that is connected to:
at least one first converter that generates at least one intermediate circuit voltage;
a first RF signal generator that is connected to at least one intermediate circuit voltage of the at least one first converter, and that generates a first signal of a basic frequency and of a first phase position;
a second RF signal generator that is connected to at least one intermediate circuit voltage of the at least one first converter, and that generates a second signal of the basic frequency and of a second phase position;
and
at least one 3 dB coupler that couples the first and the second signal and generates an output signal.

5 more elements

Dependencies are inferred from the claim text.

Vacuum plasma generator

Life of this patent

Vacuum plasma generator

Life of this patent

Abstract

Claims23