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US 7,452,422 B2Granted
Apparatus for coating photoresist having slit nozzle
AssigneeLG Display Co., Ltd.
InventorsO-Jun Kwon, Jeong-Kweon Park
Life of this patent
Estimating the term…
Abstract
An apparatus for coating a photoresist onto a substrate includes a slit nozzle to apply the photoresist to the substrate, a slit nozzle driving unit to move the slit nozzle, and a photoresist supply unit connected to the slit nozzle to supply the photoresist to the slit nozzle.
Claims28
An apparatus for coating a photoresist onto a substrate, comprising:
- a slit nozzle to apply the photoresist to the substrate;
- a slit nozzle driving unit to move the slit nozzle;
- and
- a photoresist supply unit to provide photoresist to the slit nozzle from away from the slit nozzle driving unit using a photoresist supply line, wherein the photoresist supply unit integrally moves with the slit nozzle.
1 more element
An apparatus for coating a photoresist onto a substrate, comprising:
- a slit nozzle to apply the photoresist to the substrate;
- a slit nozzle driving unit to support the slit nozzle and to move the slit nozzle on the substrate;
- a photoresist supply unit to provide photoresist to the slit nozzle from away from the slit nozzle driving unit using a photoresist supply line;
- and
- a support unit to support the photoresist supply unit and to separate the photoresist supply unit from the slit nozzle by a predetermined distance,
- wherein the photoresist supply unit integrally moves with the slit nozzle.
3 more elements
An apparatus for coating a photoresist onto a substrate, comprising:
- a slit nozzle to apply the photoresist to the substrate, the slit nozzle having a dispensing slit with a length greater than a width of the substrate;
- a slit nozzle driving unit to support the slit nozzle and to move the slit nozzle across the substrate;
- and
- a photoresist supply unit to provide photoresist to the slit nozzle from away from the slit nozzle driving unit using a photoresist supply line, wherein the photoresist supply unit integrally moves with the slit nozzle.
1 more element
An apparatus for coating a photoresist onto a substrate, comprising:
- a slit nozzle to apply the photoresist to the substrate;
- a slit nozzle driving unit to support the slit nozzle and to move the slit nozzle on the substrate;
- a photoresist supply unit to provide photoresist to the slit nozzle from away from the slit nozzle driving unit using a photoresist supply line;
- and
- a support unit to support the photoresist supply unit and to separate the photoresist supply unit from the slit nozzle by a predetermined distance,
- wherein the photoresist supply unit integrally moves with the slit nozzle.
3 more elements
Dependencies are inferred from the claim text.