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US 7,446,335 B2Granted
Process and apparatus for forming nanoparticles using radiofrequency plasmas
AssigneeRegents of the University of Minnesota
InventorsUwe Kortshagen, Elijah J. Thimsen, Lorenzo Mangolini, Ameya Bapat, David Jurbergs
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Abstract
Methods and apparatus for producing nanoparticles, including single-crystal semiconductor nanoparticles, are provided. The methods include the step of generating a constricted radiofrequency plasma in the presence of a precursor gas containing precursor molecules to form nanoparticles. Single-crystal semiconductor nanoparticles, including photoluminescent silicon nanoparticles, having diameters of no more than 10 nm may be fabricated in accordance with the methods.
Claims21
A method for producing semiconductor nanoparticles, comprising:
- providing a continuous flow of a gas containing a semiconductor-containing precursor monomer through a plasma reactor having an inlet and an outlet;
- applying a high frequency voltage between two electrodes arranged proximate the plasma chamber and thereby creating a capacitively coupled plasma in the plasma reactor;
- dissociating the semiconductor-containing precursor in the plasma to provide precursor species that nucleate and grow into semiconductor nanoparticles wherein;
- the precursor is primarily converted into nonagglomerated semiconductor nanoparticles in the high-frequency capacitively coupled plasma, and the nanoparticles are carried out of the reactor through the outlet in a continuous fashion.
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Dependencies are inferred from the claim text.