Optical element holding apparatus, exposure apparatus and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsShigeo Sakino, Hirohito Ito, Shinji Uchida, Choshoku Sai, Katsumi Asada
Life of this patent
Estimating the term…
Abstract
At least one exemplary embodiment is directed to an optical element holding apparatus including a force generating actuator configured to deform the optical element, a measuring device configured to measure a position of the optical element, and a displacement causing actuator configured to position the optical element based on the measured position.
Claims8
An apparatus for holding an optical element, the apparatus comprising:
- a deformable optical element having an optical surface and backside;
- a holder configured as a base for the apparatus;
- at least one non-contact type force generating actuator configured to deform the optical surface of the optical element, the at least one non-contact type force generating actuator being disposed between the holder and the backside of the optical element,
- wherein the at least one non-contact type force generating actuator is selectively chosen and adapted to attenuate vibration exceeding a predetermined frequency in which the vibration exceeding the predetermined frequency is capable of being transmitted through the apparatus to the optical element;
- a measuring device configured to measure a position of the physical location and overall positioning of the optical element as a whole;
- and
- at least one displacement causing actuator configured to position the physical location of and overall positioning of the optical element as whole, but not configured to deform the optical surface of the optical element,
- wherein the displacement of the physical location of and overall positioning of the optical element as a whole is based on the measured position,
- wherein the at least one displacement causing actuator is selectively chosen and adapted to attenuate vibration frequency lower than the predetermined frequency in which the vibration having the frequency lower than the predetermined frequency is capable of being transmitted through the apparatus to the optical element.
An exposure apparatus comprising:
- an optical system, wherein the exposure apparatus is configured to expose a substrate to light via the optical system and a reticle;
- and
- an apparatus for holding an optical element included in the system, the apparatus including,
- a deformable optical element having an optical surface and backside;
- a holder configured as a base for the apparatus;
- at least one non-contact type force generating actuator configured to deform the optical surface of the optical element, the at least one non-contact type force generating actuator being disposed between the holder and the backside of the optical element,
- wherein the at least one non-contact type force generating actuator is selectively chosen and adapted to attenuate vibration exceeding a predetermined frequency in which the vibration exceeding the predetermined frequency is capable of being transmitted through the apparatus to the optical element;
- a measuring device configured to measure a position of the physical location of and overall positioning of the optical element as a whole;
- and
- at least one displacement causing actuator configured to position the physical location and overall positioning of the optical element as whole, but not configured to deform the optical surface of the optical element,
- wherein the positioning of the physical location of and overall positioning of the optical element as a whole is based on the measured position,
- wherein the at least one displacement causing actuator is selectively chosen and adapted to attenuate vibration having a frequency lower than the predetermined frequency in which the vibration having the frequency lower than the predetermined frequency is capable of being transmitted through the apparatus to the optical element.
A method of manufacturing a device utilizing an exposure apparatus including an optical system, wherein the exposure apparatus is configured to expose a substrate to light via the optical system and a reticle;
- and an apparatus for holding an optical element included in the system, the apparatus including,
- a deformable optical element having an optical surface and backside;
- a holder configured as a base for the apparatus;
- at least one non-contact type force generating actuator configured to deform the optical surface of the optical element, the at least one non-contact type force generating actuator being disposed between the holder and the backside of the optical element,
- wherein the at least one non-contact type force generating actuator is selectively chosen and adapted to attenuate vibration exceeding a predetermined frequency in which the vibration exceeding the predetermined frequency is capable of being transmitted through the apparatus to the optical element;
- a measuring device configured to measure a position of the physical location of and overall positioning of the optical element as a whole;
- and
- at least one displacement causing actuator configured to position the physical location of and overall positioning of the optical element as whole, but not configured to deform the optical surface of the optical element,
- wherein the positioning of the physical location of and overall positioning of the optical element as a whole is based on the measured position,
- wherein the at least one displacement causing actuator is selectively chosen and adapted to attenuate vibration having a frequency lower than the predetermined frequency in which the vibration having the frequency lower than the predetermined frequency is capable of being transmitted through the apparatus to the optical element,
- the method comprising:
- exposing a substrate to light using the exposure apparatus;
- developing the exposed substrate;
- and
- processing the developed substrate to manufacture the device.
Dependencies are inferred from the claim text.