Apparatus and method for measurement of film thickness using improved fast fourier transformation
AssigneeEllipso Technology Co., Ltd.
InventorsSang-Youl Kim, Sang-Jun Kim
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AssigneeEllipso Technology Co., Ltd.
InventorsSang-Youl Kim, Sang-Jun Kim
Estimating the term…
The present invention relates to an apparatus and method for a measurement of a film thickness using an improved fast Fourier transformation. The apparatus includes a light source, a light receiving unit for converging a light from the light source, a detection unit for splitting a reflection light reflected by the surface of the sample and inputted into the optical fabric through the lens, and outputted to the other side of the optical fabric based on a light intensity of each wavelength and providing a certain amount of wavelength, a conversion unit for converting a wavelength based spectrum data detected by the detection unit into an analog signal and then converting into a digital signal through a converter, a computation unit for computing the number of vibrations based on a high speed Fourier transformation, and an analyzing unit for measuring a film thickness.
A film thickness measuring apparatus using a fast Fourier transformation comprising:
A method for measurement of film thickness using a fast Fourier transformation comprising the steps of:
Dependencies are inferred from the claim text.