Apparatus for scattered light inspection of optical elements

An apparatus for scattered light inspection of optical elements, comprising:

• a plurality of components, wherein a first component is a light-generating unit generating light that is irradiated onto the optical element respectively to be inspected, and a second component is a detector detecting scattered light that is emitted by the optical element during irradiation,
• wherein at least one of the plurality of components is arranged on or in a unit that is dimensioned to be held by a reticle holder or a substrate holder of a lithography exposure machine;
• and
• wherein the light-generating unit is designed to output inspection light with at least two different wavelengths, and the evaluation unit is designed for wavelength-selective evaluation of the scattered light information.

An apparatus for scattered light inspection of an optical element of a lithography exposure machine, comprising:

• a light-generating unit for generating light that is irradiated onto the optical element respectively to be inspected, and
• a detector for detecting scattered light that is emitted by the optical element of the lithography exposure machine during irradiation,
• wherein substantially all the components of the inspection apparatus are arranged on or in a common unit that is portable or mobile and is attached to a reticle holder of the lithography exposure machine;
• and
• wherein the light detected by the detector comprises light scattered outside a specular angle of reflection.

An apparatus for scattered light inspection of an optical element of a lithography exposure machine, comprising:

• a light-generating unit for generating light that is irradiated onto the optical element respectively to be inspected, and
• a detector for detecting scattered light that is emitted by the optical element of the lithography exposure machine during irradiation,
• wherein substantially all the components of the inspection apparatus are arranged on or in a common unit that is portable or mobile;
• and
• wherein the light-generating unit is designed to output inspection light with at least two different wavelengths, and the evaluation unit is designed for wavelength-selective evaluation of the scattered light information.

An apparatus for scattered light inspection of optical elements comprising:

• a plurality of components, wherein
• a first component is a light-generating unit generating light that is irradiated onto the optical element respectively to be inspected, and
• a second component is a detector detecting scattered light that is emitted by the optical element during irradiation,
• wherein the first components and the second component are arranged on or in a common unit that is held by a reticle holder of a lithography exposure machine.

An apparatus for scattered light inspection of optical elements, comprising:

• a plurality of components, wherein
• a first component is a light-generating unit generating light that is irradiated onto the optical element respectively to be inspected, and
• a second component is a detector detecting scattered light that is emitted by the optical element during irradiation,
• wherein at least one of the plurality of components is arranged on or in a unit that is held by a reticle holder of a lithography exposure machine;
• and
• wherein the apparatus is designed for angularly resolved inspection of scattered light over a range of a plurality of predetermined angles.

An apparatus for scattered light inspection of an optical element of a lithography exposure machine, comprising:

• a light-generating unit for generating light that is irradiated onto the optical element respectively to be inspected, and
• a detector for detecting scattered light that is emitted by the optical element of the lithography exposure machine during irradiation,
• wherein substantially all the components of the inspection apparatus are arranged on or in a common unit that is portable or mobile, and which is held by a reticle holder of a lithography exposure machine;
• and
• wherein the apparatus is designed for angularly resolved inspection of scattered light over a range of a plurality of predetermined angles.

An apparatus for scattered light inspection of optical elements, comprising:

• a plurality of components, wherein
• a first component is a light-generating unit generating light that is irradiated onto the optical element respectively to be inspected, and
• a second component is a detector detecting scattered light that is emitted by the optical element during irradiation, the detector including at least one of a CCD unit, a CMOS image sensor, a diode array, a line sensor, and a photomultiplier unit;
• wherein the first component and the second component are arranged on or in a unit that is held by a reticle holder of a lithography exposure machine.